Eucerin

UltraSENSITIVE REPAIR INTENSIVE SOURCE MASK

  • Clinical and dermatological proven to improve skin appearance, making skin feels more resilient, more radiant. Specially developed for irritated skin. Formulation contains SymSitive*, Centella Complex, Panthenol and Hyaluronic Acid. The mask is made from biodegradable cotton to ensure the absorption and effective delivery of active ingredients. Easy to apply. Fit for Asian face shapes. Non Comedogenic.

    Benefits:

    • Instantly calms the skin

    • Repairs and strengthens skin barrier to build skin's own resilience

    • Reduces dryness, hydrates & boosts skin's power to retain skin moisture level

    How To Use:

    1. Open & unfold the mask. Remove & discard the white sheet.

    2. Apply the mask to well-cleansed, dry face, using your fingers to adhere evenly and fit the mask to your liking.

    3. Leave on for 15 minutes then remove and discard mask. Gently massage any excess serum into the skin.

  • Aqua, Butylene Glycol, Glycerin, Dipropylene Glycol, Panthenol, 4-t-Butylcyclohexanol, Hyaluronic Acid, Hydrolyzed-Hyaluronic Acid, Arginine, Allantoin, 1,2-Hexanediol, Propanediol, Polysorbate 20, Polysorbate 60, Hydroxyacetophenone, Pentylene Glycol, Carbomer, Ethylhexylglycerin, Hydroxyethylcellulose, Sodium Hyaluronate, Sodium Phosphate, Centella Asiatica Extract, Centella Asiatica Leaf Extract, Centella Asiatica Root Extract, Pinus Pinaster Bark Extract, Asiatic Acid, Asiaticoside, Madecassic Acid, Madecassoside, Disodium Phosphate, Disodium EDTA